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博學堂講座預告(第462講)

來源:浙江工業大學理學院 | 2019-10-10 | 發布:經管之家


報告題目: X-ray
Photoelectron Spectroscopy (XPS) and its application in material surface and
interface characterization



報告摘要: X-ray Photoelectron Spectroscopy (XPS) is an extremely surface
sensitive non-destructive technique that provides quantitative surface chemical
state information for almost all elements. It is the most established and
widely used surface analysis technique. In this presentation, firstly, I will
give you some basic knowledge of XPS such as its physical basis, why is the XPS
technique surface sensitive? Chemical shifts, quantification of XPS, etc. Secondly,
I will show you the development of XPS instrumentation and some points in XPS
measurement and data process such as charge compensation and referencing for
insulators and spectral fitting. Finally, I will give you a review of its
application in material surface and interface analysis. The review will be
focused in determination of individual nanostructured features of materials and
hetero-junction band offsets. Although many newly developing tools with high
spatial resolution play important role in this analysis XPS is still considered
as an essential tool for understanding several important aspects of
nanostructured materials that cannot easily be observed using other techniques.
But the question of how the nanostructured material features impact XPS data
have been heavily debated in the scientific community, which limits its
application in characterization of nanostructured materials. The performance of
any type of hetero-junction device is determined by band energy alignment (band
offsets) of material interfaces which form the hetero-junction. Therefore,
accurately determining hetero-junction band offsets and tuning them to a
desired application would have an obvious impact on the optimization of the
devices. The effects of chemical shift, differential charging, band bending and
photoemission final state on the XPS measurement accuracy and reliability will
be discussed.



時間地點:2019年10月15日 下午14:00 理A110



報告人:潘冀生博士 新加坡科技研究局,材料研究與工程研究院資深研究員,并兼任新加坡國立大學物理系客座教授,博士生導師



報告人簡介:潘冀生博士,現任新加坡科技研究局,材料研究與工程研究院資深研究員,并兼任新加坡國立大學物理系客座教授,博士生導師。潘博士于1985年在杭州大學(現在浙江大學)物理系獲學士學位;1988年獲中國科學院上海應用物理研究所碩士學位;1998年獲新加坡國立大學博士學位。其主要研究方向:高溫等離子體和高壓冷鍍膜技術及其在航空發動機,汽車工業和防腐蝕方面的運用;二維材料和功能薄膜的生長,表征和在納米,微米電子器件中的運用;改進了用x射線光電子能譜測量能差的方法;離子束表面改性和表面形貌的形成;表面和界面分析技術(X射線光電子能譜,俄歇電子能譜,二次離子質譜)在工業材料失效分析中的運用。到現在為止,潘博士在國際學術雜志上共發表文章280余篇,在國際學術會議上發表了100多次演講。他也得到了很多獎項。例如,新加坡科技研究局航空研究項目杰出成就獎;新加坡合格評定國家認可委員會杰出評定員銀獎;中國科學院自然科學三等獎;中國科學院優秀青年核工作者等。他也有許多社會兼職,包括新加坡合格評定國家認可委員會技術評定員;國際標準化組織(ISO)TC201表面化學分析技術委員會新加坡分會委員;國際標準化組織(ISO)TC229納米技術委員會新加坡分會專家組成員;學術期刊《表面和界面分析》(Surface and Interface Analysis) 編輯; 學術期刊《科學報告》(Scientific Report)和《光譜學》編委。
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